Photoresists for Semiconductors

• Photosensitive resin liquids are used in the process of forming high-density, high-integration circuit patterns on the surface of substrates during semiconductor manufacturing.
  

• High performance required for microfabrication is achieved by utilizing our proprietary synthesis and design technologies

• Various lineups available to meet customer needs
  ➡Light sources for exposure: i-line, KrF, ArF, and EB
  ➡Type: Positive/negative type
  ➡Film thickness: from less than 1 μm to several μm